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Journal

1.       A. E. Islam and M. A. Alam, “Variation Robustness in Strained MOSFET”, Submitted to IEEE Electron Device Letters, 2009.

2.       S. Deora, V. D. Maheta, A. E. Islam, M. A. Alam, and S. Mahapatra, “A Common Framework of NBTI Generation and Recovery in Plasma Nitrided SiON p-MOSFETs”, IEEE Electron Device Letters, accepted, 2009.

3.       S. Mahapatra, V. D. Maheta, S. Deora, E. N. Kumar, S. Purawat, C. Olsen, K. Ahmed, A. E. Islam and M. A. Alam, “Material Dependence of Negative Bias Temperature Instability (NBTI) Stress and Recovery in SiON p-MOSFETs”, (Invited Paper) Journal of Electrochemical Society, 2009. PDF

4.       S. Mahapatra, V. D. Maheta, A. E. Islam, and M. A. Alam, “Isolation of NBTI Stress Generated Interface Trap and Hole-Trapping Components in PNO p-MOSFETs”, IEEE Transaction of Electron Devices (T-ED), 56(2), pp. 236-242, 2009. PDF

5.       M. Masuduzzaman, A. E. Islam, and M. A. Alam, “Exploring the Capability of Multi-Frequency Charge Pumping in Resolving Location and Energy Levels of Traps within Dielectric”, IEEE Transaction of Electron Devices (T-ED), 55(12), pp. 3421-3431, 2008. PDF

6.       A. E. Islam, and M. A. Alam, “On the Possibility of Degradation-Free Field Effect Transistors”, Applied Physics Letter, 92 (173504), 2008. PDF

7.       A. E. Islam, G. Gupta, K. Ahmed, S. Mahapatra, M. A. Alam, “Optimization of Gate Leakage and NBTI for Plasma-Nitrided Gate Oxides by Numerical and Analytical Models”, IEEE Transaction of Electron Devices (T-ED), 55(5), pp. 1143-1152, 2008. PDF

8.       A. E. Islam, H. Kufluoglu, D. Varghese, S. Mahapatra, and M. A. Alam, “Recent Issues in Negative Bias Temperature Instability: Initial Degradation, Field-Dependence of Interface Trap Generation, and Hole Trapping Effects and Relaxation”, (Invited Paper, Special Issue on Modeling of Nanoscale Transistors) IEEE Transaction of Electron Devices (T-ED), 54(9), pp. 2143-2154, 2007. PDF

9.       A. E. Islam, H. Kufluoglu, D. Varghese, and M. A. Alam, “A Critical Analysis of Short-term Negative Bias Temperature Instability Measurements: Explaining the effect of time-zero delay for On-the-fly Measurements”, Applied Physics Letter, 90 (083505), 2007. PDF

10.    A. E. Islam, A. Haque, “Accumulation gate capacitance of MOS devices with ultra-thin high-K gate dielectrics: Modeling and Characterization”, IEEE Transaction of Electron Devices (T-ED), 53(6), pp. 1364-1372, 2006. PDF

 

Conference

11.    A. E. Islam, S. Mahapatra, S. Deora, V. D. Maheta, and M. A. Alam, “On The Differences Between Ultra-fast NBTI Experiments and Reaction-Diffusion Theory”, International Electron Devices Meeting (IEDM) 2009, session 31.2.

12.    A. E. Islam and M. A. Alam, “Self-Optimizing Defect Generation for Advanced CMOS Substrates”, International Integrated Reliability Workshop (IIRW) 2009, session ….

13.    M. A. Alam and A. E. Islam, “On the Reliability of and Self-Compensation in Strained Transistors”, (Invited) International Conference on Solid State Devices and Materials (SSDM) 2009, session B-9-1.

14.    M. Masuduzzaman, A. E. Islam, and M. A. Alam, “Physics and Mechanics of Dielectric Trap Profiling by Multi-frequency Charge Pumping Method”, to appear in International Reliability Physics Symposium, April 2009.

15.    A. E. Islam, J. H. Lee, W. H. Wu, A. Oates and M. A. Alam, “Universality of Interface Trap Generation and Its Impact on ID Degradation in Strained/Unstrained PMOS Devices During NBTI Stress”, Proceedings of International Electron Devices Meeting (IEDM) 2008, pp. 107-110. PDF Breeze Presentation

16.    A. E. Islam, V. D. Maheta, H. Das, S. Mahapatra, and M. A. Alam, “Mobility Degradation Due to Interface Traps in Plasma Oxinitride PMOS Devices”, Proceedings of International Reliability Physics Symposium (IRPS) 2008, pp. 87-96. PDF    Breeze Presentation

17.    J. H. Lee, W. H. Wu, A. E. Islam, M. A. Alam and A. S. Oates, “Separation method of hole trapping and interface trap generation and their roles in NBTI Reaction-Diffusion model”, Proceedings of International Reliability Physics Symposium (IRPS) 2008, pp. 745-746. PDF

18.    A. E. Islam, E. N. Kumar, H. Das, S. Purawat, V. D. Maheta, H. Aono, E. Murakami, S. Mahapatra, and M. A. Alam, “Theory and Practice of On-the-fly and Ultra-fast VT Measurements for NBTI Degradation: Challenges and Opportunities”, Proceedings of International Electron Devices Meeting (IEDM) 2007, pp. 805-808. (Nominated for Roger A. Haken Best Student Paper Award) PDF

19.    E. N. Kumar, V. D. Maheta, S. Purawat, S. Rani, A. E. Islam, K. Ahmed, M. A. Alam and S. Mahapatra, “Material Dependence of NBTI Physical Mechanism in Silicon Oxynitride (SiON) p-MOSFETs: A Comprehensive Study by Ultra-Fast On-The-Fly (UF-OTF) IDLIN Technique”, Proceedings of International Electron Devices Meeting (IEDM) 2007, pp. 809-812. PDF

20.    Kunhyuk Kang, Keejong Kim, Ahmad E. Islam, Muhammad A. Alam, and Kaushik Roy, “Characterization and Estimation of Circuit Reliability Degradation under NBTI using On-Line IDDQ Measurement”, Proceedings of 44th Design Automation Conference, 20.1, June 2007. (Nominated for Best Paper Award) PDF

21.    S. Mahapatra, K. Ahmed, D. Varghese, A. E. Islam, G. Gupta, L. Madhav, D. Saha and M. A. Alam, “On the Physical Mechanism of NBTI in Silicon Oxynitride p-MOSFETs: Can Differences in Insulator Processing Conditions Resolve the Interface Trap Generation versus Hole Trapping Controversy?”, Proceedings of International Reliability Physics Symposium (IRPS) 2007, pp. 1-9. PDF

22.    A. E. Islam, G. Gupta, S. Mahapatra, A. T. Krishnan, K. Ahmed, F. Nouri, A. S. Oates, and M. A. Alam, “Gate Leakage vs. NBTI for Plasma Nitrided Oxides: Characterization, Physical Principles and Optimization”, Proceedings of International Electron Devices Meeting (IEDM) 2006, pp. 12.4.1. PDF

 

Patent

23.    A. E. Islam, and M. A. Alam, “Field Effect Transistors Having Negligible Drain Current Degradation”, Patent Pending (Submitted: March 5, 2008).

 

Undergraduate Works (Journals & Conferences):

24.     A.E. Islam, S.M.J. Al-Kadry, and M.W.K. Nomani, "Designing a Spectrum Analyzer Using Parallel Port Interfacing", Bangladesh Journal of Information & Communication Technology, vol. 9, 2005. PDF

25.    A.E. Islam, S.M.J. Al-Kadry, and A.N.M. Zainuddin, "A Novel Algorithm for using a Microcontroller in Controlling Adjustable Speed Drive", Bangladesh Journal of Information & Communication Technology, vol. 8, 2004. PDF

26.    A. E. Islam, K.M. Rahman, M.A. Choudhury, S.M.J. Al-Kadry, A.M. Rizwan, M.M. Islam, and S.M.M. Rahman, “Low Cost Implementation of High Resolution PWM Scheme for ASD”, ICECE, Dhaka, Bangladesh, December 28-30, 2004. PDF

Simulation Tool

27.     “Device Reliability Tool on nanoHUB

§  Contributors: Ahmad Ehteshamul Islam, Haldun Kufluoglu, Muhammad Ashraful Alam

§  Analyzes MOS device reliability based on Negative Bias Temperature Instability (NBTI).

 

Research Presentations

IEEE EDS (Bangladesh Chapter) Student Seminar, January 2009, United International University & East West University, Bangladesh

§  Interfacial Defects: History, Modeling, Effects & Optimization

 

NCN Student Symposium, Summer 2008, Purdue University, Indiana, USA

§  Trap Formation in CMOS Devices: Characterization, Modeling & Optimization

 

Birck Nanotechnology Center Annual Review 2008, April 14, Purdue University, Indiana, USA

§  Characterization and Modeling of Trap Generation: A Primer on “Why and How the Transistors Degrade” PDF

 

SRC GRC ICSS Annual Review 2007, October 23-24, UMass-Amherst, Massachusetts, USA

§  Integrated Framework for Reliability and Process-Variation Aware Design Methodology for VLSI Circuits

 

SRC GRC ICSS Annual Review 2006, October 6-8, UIUC, Illinois, USA

§  Modeling of Negative Bias Temperature Instability and Hot Carrier Injection PDF

 

NCN Annual Review, June 20-22, Purdue University, Indiana, USA

§  Computational Modeling of Negative Bias Temperature Instability (NBTI) for Reliability-aware VLSI Design PDF

 

Advanced Energy, NCSU, North Carolina, USA        (20-24 May 2003)

§  FEC 2003 project’s final report.

 

Applied Power Electronic Conference (APEC) 2003, Florida, USA (9th Feb 2003)

§  Progress report of the FEC 2003 project.