Facility

Laser systems:

Continuum Surelite III laser (Pulsed, 7-10ns, 0.9J/pulse @ 1064nm, 0.45J/pulse @ 532nm,  0.25J/pulse @ 355nm).
Nd:YAG laser (Scimitar Laser & 2800): CW & QS modes, CW: 150W,  QS: 1K~50KHz,   25mJ/pulse @1KHz,  5mJ@50KHz)

Deposition systems:
Pulse laser deposition
Dip coater with temperature control.
Electrodeposition (Princeton Applied Research)

Mechanical Property & Microstructure Characterization:
High temperature high cyclic fatigue testing (up to 1270K).

X-ray microdiffraction (Bruker D8 Discover super speed solution, smallest beam size: 10 micron)

 

Monitoring and Material Preparation apparatus:

CCD camera (10X to 92X)
Electropolishing
Magnetic stirrer
Hot plate

Motion control:

Motored XYZ stage with resolution of 40nm.

Imaging

Optical Microscope (10X to 1600X)

VEECO WYKO HD 3300

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Scalable Micro Nano Manufacturing Laboratory

Purdue University